(Nanowerk News) Toshiba Corporation and the National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that ...
ASML Optics has shown the first patterns using the full-field EUV (extreme-ultraviolet) alpha demo tool at the State University of New York—Albany’s College of Nanoscale Science and Engineering. The ...
SAN JOSE, Calif. — Lam Research Corp. has rolled out the 2300 Motif, a post-lithography pattern enhancement system. Based on a proprietary plasma-assisted process, the new system delivers ...
The groundbreaking discovery could open new doors for other researchers working with delicate materials such as cell membranes. (Nanowerk News) Imagine drawing on something as delicate as a living ...
Researchers have demonstrated a novel way to inscribe microscopic patterns on living organisms, using the resilient tardigrade as a model. The study, published in Nano Letters, explores a technique ...
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