TOKYO, December 12, 2024--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of ...

PORTLAND, Ore. — A demonstration of terabit-per-square-inch densities for hard-disk media used self-assembling block co-polymers to perform “density multiplication.” The technique, demonstrated by ...

Self-assembling materials spontaneously form structures at length scales of interest in nanotechnology. In the particular case of block copolymers, the thermodynamic driving forces for self-assembly ...

A new startup has emerged and unveiled a technology that addresses one of the bigger but less understood problems in advanced lithography–pattern roughness. The startup, called Fractilia, is a ...

The ability to create intricate, nano-scale patterns is at the heart of nanotechnology, and lithography techniques are the tools that make this possible. From photolithography to FIB, each technique ...

Semiconductor Engineering sat down to discuss lithography and photomask technologies with Gregory McIntyre, director of the Advanced Patterning Department at IMEC; Harry Levinson, senior fellow and ...