The precise control of feature sizes exhibits great importance in fabricating nanodevices for optoelectronics, plasmonics, meta-optics, and biosciences, just to name a few. Some applications require ...

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP) (TOKYO: 7912) has successfully developed a photomask manufacturing process capable of accommodating the 3-nanometer (10-9 meter) lithography ...

2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...

M. K. Sears, J. Bekaert, B. W. Smith, "Pupil wavefront manipulation for optical nanolithography", Proc. SPIE 8326, (2012) paper M. K. Sears, G. Fenger, J. Mailfert, B ...

In semiconductor manufacturing, lithography is a critical process that uses light to transfer intricate circuit (IC) patterns onto a silicon wafer. This process enables the creation of tiny ...

In the semiconductor materials industry, photolithography is a crucial technology for creating intricate electronic circuits. Essentially, it’s the art of printing at the nanoscale level, enabling the ...

ESOL has developed a standalone interference extreme ultraviolet (EUV) lithography tool for use in R&D applications. The system, called EMiLE (EUV Micro-interference Lithography Equipment), is primary ...